立式化学气相沉积炉（沉积炭）
立式化学气相沉积炉（沉积炭）可用于以碳氢气体（如C3H8等）为碳源的材料表面或基体等温CVD/CVI处理。
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化学气相沉积炉（沉积炭） | 化学气相沉积炉（沉积炭）可用于以碳氢气体（如C3H8等）为碳源的材料表面或基体等温CVD/CVI处理。 |
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立式真空碳化炉 | 该类型设备可设计成采用石墨作为加热体的有碳加热环境，最高温度可达1600℃以上，用于炭/炭复合材料、陶瓷基复合材料、碳纤维保温材料的高温碳化、裂解处理。也可设计成采用金属作为加热体无碳加热环境，最高温度1100℃，用于特殊材料在有氧下的脱脂、烧结等处理。 |
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全自动碳化炉 | 该设备主要用于钨粉的碳化、金属粉末的还原，也可用于铜钨合金的烧结、钨钼高比重合金的烧结等工艺。 |
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立式底装料高真空钎焊炉 | 该立式底装料高真空钎焊炉主要用于有色金属、不锈钢、钛合金、高温合金、硬质合金等的真空钎焊。 |
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Vacuum Debinding and Sinter Furnace | Vacuum debinding and sinter furnace is mainly suitable for debinding and sinter process of tungsten alloy, heavy alloy, moly alloy, titanium alloy ... |
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