tantalum sputtering targets
tantalum sputtering targets
Tantalum Sputtering Targets
Tantalum(Ta) is one of the rare, hard, blue gray, and highly corrosion-resistant refractory metals. The melting point of tantalum is 2980 ℃, and the density is 16.68g/cm³. Tantalum has a series of excellent properties, including high melting point, low vapor pressure, good cold working performance, high chemical stability, strong resistance to liquid metal corrosion, and large dielectric constant of surface oxide film. Tantalum targets are mainly used in semiconductor coating, optical coating, flat panel displays, optical information storage space industries, glass coating industries such as automotive and architectural glass, optical communication, etc.
Tantalum Sputtering Targetsare made from tantalum of the highest purity, ensuring a consistent and reliable composition. The high density of the material increases sputtering efficiency and improves film adhesion. The low content of impurities and gases in tantalum enables excellent film quality and uniformity. In addition, the material is easy to process and can be precisely molded to meet specific application requirements. Their adaptability and reliability make them an important part of many sputter deposition processes.
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