Cerium Oxide Slurry for Quartz Glass

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Cerium Oxide for Glass

Kona provides polishing slurrywith cerium oxide abrasive for quartz glass, we also provide cerium polishing powder. Our cerium oxide slurryand powders which has long slurry life, good finish with no compromise of fast removal rate.

CERIUM OXIDE SLURRY FOR QUARTZ GLASS FEATURES

Quartz glass is a typical optical material, which has been used as quartz glass substrate and other components. It is hard than common glass.

Kona CeO2 slurries were developed for quarts glass polishing with an aggressive removal speed and good surface roughness& finish. Our cerium oxide slurry can be reused, it has a long slurry life (some of our clients' plants even continue to use our polishing slurry for half a month before completely replacing it)

We also provide cerium oxide powder for quartz glass polishing.

Some special precision polishing for quarts glass may use nano silica colloidal.

DETAILS OF CERIUM OXIDE SLURRY FOR QUARTZ GLASS

Quartz glass is a special industrial glass with a single component of silicon oxide. Compared with ordinary glass, this kind of glass has higher Mohs hardness, higher temperature resistance, better light transmission performance, more stable chemical characteristics and other advantages. Because of its excellent properties, quartz glass material is widely used in semiconductor, aerospace and other industries.

Quartz glass needs to be down through the mechanical processing process before using such as slicing and cutting, so it needs to be polished to remove the lines, scratches and other defects on the surface of the glass during mechanical processing, improve the gloss and transparency of the glass.

As a cerium oxide polishing powder manufacturer, Kona provides cerium oxide polishing slurry, developed according to the characteristics of quartz glass with long slurry life, high efficiency and easy to use. We can also supply cerium oxide polishing powder directly to customers.

If you want to buy cerium oxide powder, please contact us.

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