KOH Developer
KOH Developer
Description
The main components of , KOH, surfactant and metal protective agent, can dissolve the uncured part of the photoresist and develop the part exposed to ultraviolet light, with faster development speed and higher selectivity. The optimal pH value for development is between 12-13. In addition, the developer also contains some auxiliary agents such as surfactants and antioxidants, which can also improve the performance of the developer and improve the development effect and stability. However, potassium hydroxide series developers contain mobile ion contamination (MIC), which is not suitable for high-performance display panels and integrated circuit industries that are very sensitive to pollution.
Features
2. High development efficiency: KOH developer has a high development rate for certain photoresists (such as positive photoresists) and can quickly dissolve unexposed parts.
Application
1. Semiconductor manufacturing: In the early photolithography process, KOH developer was widely used for the development of positive photoresist, but as the purity and performance requirements of semiconductor processes increased, KOH was gradually replaced by metal-free developers such as TMAH.
2. Printed circuit boards (PCBs): In PCB manufacturing, KOH developer is used to remove unexposed photoresist and form circuit patterns.
3. Micro-electromechanical systems (MEMS): KOH developer is also used in MEMS processes, such as anisotropic etching of silicon wafers.
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