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Atomic Layer Deposition for R&D

Atomic Layer Deposition for R&D

Material Compatibility:

Oxides: Al₂O₃, SiO₂, TiO₂, ZnO, ZrO₂, HfO₂, Ta₂O₅, MgO, etc.

Nitrides: AlN, TiN, ZrN, HfN, WN

Metals: Ru, Pd, Pt, Ni, Co, W

Sulfides: MoS₂, WS₂, ZnS, TiS₂


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