Sapphire Substrate Polishing Slurry
Sapphire Substrate Polishing Slurry
Sapphire wafer is the most widely used substrate material in the semiconductor lighting industry, we developed Silica Colloidal and Alumina Slurry for sapphire substrate polishing.
Kona's Sapphire Substrate Polishing Slurry is designed to meet the demanding requirements of polishing sapphire substrates. Our colloidal silicaslurries provide a superior surface finish with no compromise on polishing rates. With high-purity raw materials, our alumina slurries are idealy designed for C-plane sapphire with a fast removal rate and controlled surface finish. The slurry range is available in a wide range of particle sizes to cater to different polishing needs, including fine and rough polishing. Additionally, our Sapphire Substrate Polishing Slurry is compatible with various polishing machines and pads and provides cost-effective solutions for sapphire substrate polishing.
SAPPHIRE SUBSTRATE POLISHING SLURRY FEATURES
Sapphire Substrate is a kind of extremely hard semiconductor substrates, Kona engineering developed Sphere Substrate Polishing Slurry, including colloidal silica and alumina slurry.
In most cases, diamond abrasives is used for sapphire grading. However, which leaves scratches and other strains on the sapphire surface. So sapphire substrates need to be polished use colloidal silica or alumina slurry.
Kona sapphire colloidal silica polishing suspensionespecially developed for Sapphire, with increased abrasive particle size, which can improve the removal rate as well as no compromise with high quality surface.
Our aluminium rough and final polishing slurry developed for C- Plane Sapphire, with a fast removal rate and controlled surface finish.
DETAILS OF SAPPHIRE SUBSTRATE POLISHING SLURRY
Sapphire substrate is currently the mainstream substrate used for UV LED. Common size of sapphire substrates are 2", 4" and 6". Sapphire substrate has the characteristics of good light transmittance, high temperature resistance, corrosion resistance and high commercialization maturity.
Kona developed silica colloidal for sapphire substrate final polishing, also provides alumina slurry for sapphire substrate rough and final polishing.
|
Pro Name |
Silica colloidal for sapphire |
|
Base Abrasive |
Silica Colloidal |
|
Appearance |
White liquid |
|
PH |
9-12 |
|
Solvent Type |
Water-based |
|
Shelf Life |
12 months |
|
Pro Name |
C-plane sapphire polishing slurry |
|
Base Abrasive |
Alumina |
|
Appearance |
White slurry |
|
PH |
9-14 |
|
Solvent Type |
Water-based |
|
Shelf Life |
12 months |
Send product request
Other supplier products
| Powder Metal Polishing Slurry | Powder Metal Polishing Slurry Our alumina slurry used for rough powder metal polishing, provides an aggressive removal rate and controlled surface... | |
| A-Plane Sapphire Colloidal Silica | Kona series Sapphire Polishing Slurry developed for kinds of Sapphire products, such as sapphire lens and sapphire substrate. Our colloidal silica ... | |
| Sapphire Window Polishing Slurry | Sapphire Window Polishing Slurry Kona's sapphire window polishing slurry is a specially formulated product designed to cater for the unique requir... | |
| Plastic Lens Polishing Slurry | Plastic Lens Polishing Slurry The Mohs hardness of the resin lens can reach 6-7 after hardening treatment, so we choose alumina as based abrasives... | |
| Aluminum Alloy Polishing Slurry | Our alumina polishing slurryand colloidal silica used for aluminum alloy lapping and polishing, provide a fast removal rate and good flatness and f... |
Same products
| 2-Amino-6-chloropurine 10310-21-1 | Seller: Xinxiang Ruicheng Technology Co.,Ltd. | 2-Amino-6-chloropurine 10310-21-1 2-Amino-6-chloropurineis a reactive purine compound used as a ... | |
| Xanthine 69-89-6 | Seller: Xinxiang Ruicheng Technology Co.,Ltd. | Xanthine 69-89-6 Xanthineis a natural purine base that serves as a key intermediate in purine me... | |
| Hypoxanthine 68-94-0 | Seller: Xinxiang Ruicheng Technology Co.,Ltd. | Hypoxanthine 68-94-0 Hypoxanthineis a naturally occurring purine derivative involved in nucleoti... | |
| N,9-Diacetylguanine 3056-33-5 | Seller: Xinxiang Ruicheng Technology Co.,Ltd. | N,9-Diacetylguanine 3056-33-5 N,9-Diacetylguanine is a protected derivative of guanine designed ... | |
| Trichlorophenylsilane | Seller: Hocon International Co., Ltd. | Trichlorophenylsilane Application Packaging and Storage Besupplied in 250Kg steel drum,Polyeth... |















