.

Electronic grade nitric acid

Molecular formula

Purity level

UP-SS

UP-S

UP

EL

H₂O₂

HCI

H2S04

Hn03

HF

NH3,H20

C2H402

Na0H

K0H

Other high-purity reagents

R&D and production according to customer requirements

Product standards

Standard specification for ultraclean and high-purity electronic chemicals
EL level UP level UP-S level UP-SS level
Processing Technology of Small and Medium Scale Integrated Circuits and Electronic Components Manufacturing process of integrated circuit and TFT-LCD above 0.8 μ m 0.2-0.8 micron IC processing technology 0.18-0.09 micron line width integrated circuit processing technology
Control 1 micron particle size Filter through 0.2 μ m aperture filter to control 0.5 μ m particles Filtered by 0.05 μ m aperture filter to control 0.2 μ m particles Filtered by 0.05 μ m aperture filter to control 0.2 μ m particles
Metal impurity content is less than 100ppb Metal impurity content is less than 10ppb Metal impurity content is less than 1 ppb Impurity content of single metal ion ≤ 0.1ppb
Meet SEMI C1 C2 standard Filling in 100 level purified environment, meeting SEMIC7 standard Filling in 100 level purified environment, meeting SEMIC8 standard Filling in 100 level purified environment, meeting SEMIGrade4 standard

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