Titanium nitride vacuum coating equipment PVD chamber TiN coating machine
Physical Vapor Deposition (PVD) comprises a group of surface coating technologies used for decorative coating, tool coating, and other equipment coating applications. It is fundamentally a vaporization coating process in which the basic mechanism is an atom by atom transfer of material from the solid phase to the vapor phase and back to the solid phase, gradually building a film on the surface to be coated. In the case of reactive deposition, the depositing material reacts with a gaseous environment of co-deposited material to form a film of compound material, such as a nitride, oxide, carbide or carbonitride.
There are three basic process categories considered as PVD technologies: ion plating, evaporation, and sputtering. All utilize the same three fundamental steps to develop a coating. Each of the PVD technologies generate and deposit material in a somewhat different manner, requiring equipment unique to each process.
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