Electronic grade nitric acid
Product standards
| Standard specification for ultraclean and high-purity electronic chemicals | |||
| EL level | UP level | UP-S level | UP-SS level |
| Processing Technology of Small and Medium Scale Integrated Circuits and Electronic Components | Manufacturing process of integrated circuit and TFT-LCD above 0.8 μ m | 0.2-0.8 micron IC processing technology | 0.18-0.09 micron line width integrated circuit processing technology |
| Control 1 micron particle size | Filter through 0.2 μ m aperture filter to control 0.5 μ m particles | Filtered by 0.05 μ m aperture filter to control 0.2 μ m particles | Filtered by 0.05 μ m aperture filter to control 0.2 μ m particles |
| Metal impurity content is less than 100ppb | Metal impurity content is less than 10ppb | Metal impurity content is less than 1 ppb | Impurity content of single metal ion ≤ 0.1ppb |
| Meet SEMI C1 C2 standard | Filling in 100 level purified environment, meeting SEMIC7 standard | Filling in 100 level purified environment, meeting SEMIC8 standard |
Filling in 100 level purified environment, meeting SEMIGrade4 standard |
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