Electronic grade nitric acid

Product standards

Standard specification for ultraclean and high-purity electronic chemicals
EL level	UP level	UP-S level	UP-SS level
Processing Technology of Small and Medium Scale Integrated Circuits and Electronic Components	Manufacturing process of integrated circuit and TFT-LCD above 0.8 μ m	0.2-0.8 micron IC processing technology	0.18-0.09 micron line width integrated circuit processing technology
Control 1 micron particle size	Filter through 0.2 μ m aperture filter to control 0.5 μ m particles	Filtered by 0.05 μ m aperture filter to control 0.2 μ m particles	Filtered by 0.05 μ m aperture filter to control 0.2 μ m particles
Metal impurity content is less than 100ppb	Metal impurity content is less than 10ppb	Metal impurity content is less than 1 ppb	Impurity content of single metal ion ≤ 0.1ppb
Meet SEMI C1 C2 standard	Filling in 100 level purified environment, meeting SEMIC7 standard	Filling in 100 level purified environment, meeting SEMIC8 standard	Filling in 100 level purified environment, meeting SEMIGrade4 standard

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