4-Acetoxystyrene
4-Acetoxystyrene
4-Acetoxystyrene monomer is mainly used in the synthesis of polyhydroxystyrene. Polyhydroxystyrene is the main component fo photoresist which currently is the main body of the 248nm photoresist resin. 248nm photoresist is mainly used in the field of microelectronic chips and liquid crystal displays,with the wavelength of 248nmKrf laser for processing medium,widely used in the large-scale industrialization lithography production.
Through continuous research and innovation,our company develop a set of industrial production process of the products nd produce qualified industrial samples.It will be a positive role in promoting the 248nm photoresist localization.
Molecular Formula: C10H10O2
Molecular Weight:162.19
Appearance:colorless transparent liquid,no floating debris
Melting Point:7-8℃(lit.)
Boiling point:260℃(lit.)
Density:1.06 g/ml at 25℃(lit.)
Flash Point: 190 °F
Other supplier products
|
dry strength agent for paper |
Dry strength agent is in the original dry strength agent, based on imported raw materials, research and production of new paper dry strength agent,... |
|
Alkyl Ketene Dimer |
Alkyl Ketene Dimer (AKD)-Paper Sizing Agent
Performance characteristics
1 significantly improves the paper printing surface strength, shortening th... |
|
Dry strength agent |
Dry strength agent can be widely used in papermaking of packaging paper, household paper, newsprint, cultural paper and other paper. It can effecti... |
|
93-11-8 |
2-Naphthalenesulfonyl chloride
Synonyms:2-Naphthylsulfonyl chloride,beta-Naphthalenesulfochloride
Appearance:white powder
CAS NO:93-11-8
Molecu... |
|
17852-52-7 |
4-Sulfonamidophenylhydrazine hydrochloride
4-Sulfonamidophenylhydrazine hydrochloride is used in pharmaceutical intermediate and other. It’s mainl... |
All supplier products
Same products