kokusai T40P-R
AboutKokusai Electric
Kokusai Electricis a leading company in providing high-productivity batch processing systems and services for memory, foundry and logic customers.Kokusai Electricproduces semiconductor manufacturing equipment that leverages world-class coating technology, delivering products and services to the world’s top manufacturers.Kokusai Electricenables the increasingly high functionality and high performance of semiconductors.
Products &Systems
Batch Processing Systems
★High Quality & High Performance Thermal Processing System“TSURUGI-C²
★High-productivity Batch Processing System“AdvancedAce®-300”
★Batch High Temperature Anneal Processing System
★Batch Thermal Process System for 200mm Wafers“VERTRON®Revolution”
Single Wafer Processing System
★Single Wafer Plasma Nitridation / Oxidation System“MARORA®”
★Single wafer Annealing system“TANDUO®”
★Dry Resist Strip System“Lambda300”
Advanced Thermal Process Technology
Overview
KOKUSAI ELECTRIC is proud to introduce a novel, next generation deposition technique, Balance Controlled Deposition (BCD®).
The BCD®technique provides lower temperature processing and tighter process control for advanced small geometry devices while maintaining very high productivity, which can benefit a wide range of users and process applications.
Features
Excellent step coverage
Precise Film Property Control
Low Temperature Deposition
Good film thickness uniformity
Low Contamination
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| EP3*A | RD63F200 | IC694MDL740 |
| EH1*A | RMS-TIG-TZ-C | IC695ALG608-EA |
| IC698RMX016CA | TSXP4720 | IC694ALG392 |
| IC695ETM001 | TSXP47455 | U-55T |
| HE693THM449 | TSXP57153M | ULTRAMAT237MB2331-0BP00-2CA0 |
| IC670ALG630 | TSXP67455TSX6740 | W89070-U2321-A6 |
| DS200TCPSG1APE | UST21(R) | DS3800NGDD1C1B |
| DS215TCQAG1BZZ01A | DS3800NGDC1A1A | IS200TDBSH2AIS200TDBSH2AAA |
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