Wolfram planar sputtering targets
Material: pure tungstenStatus: polishedSize: thickness (less than x) 20mm width (less than 300mm) x Length (less than 500mm)Application: mainly used in the semiconductor industry, and flat panel display (TFT-LCD), thin-film solar and glass coating industry (including architectural glass, automotive glass, optical film glass), surface engineering, decoration & tools, magnetic, optical) recording medium, micro electronics, automobile lamp, decorative coating and so on. Can provide high purity target plane and rotating target. Tungsten and the alloy anode target: our specializing in the production of X-ray tube anode material, such as pure tungsten target, tungsten rhenium alloy target tungsten rhenium graphite target. Can provide high purity target plane and rotating target. The target can withstand extreme temperatures above 2000 degrees Celsius, good quality, long service life.
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Product Name: niobium tube, niobium capillaryExecution standard: B394-98 ASTMBrand: RO4200-1, RO4210-2Specifications: diameter 1.0-150mmThickness 0... |
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Molybedenum round sputtering targets 名称钼含量密度规格纯钼元片≥99.95%≥10.2g/cm3ΦT(0.1-20)mm×650(max)mm高温钼元片≥99%≥10g/cm3ΦT(0.1-20)mm×650(max)mm 可根据客户要求,生产钼元片、钼方... |
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High pure oxide, a silicon oxide, silicon dioxide and hafnium oxide, zirconium oxide, titanium dioxide, titanium dioxide, dioxide Ti, V 2O 3 titani... |
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Mo target platesPurity molybdenum >99.95%* density: cm3 10.2g/* thickness: 0.2-20MM* surface: black, alkali wash, PolishFor the production of elect... |
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Product Name: tantalum sputtering targetExecution standard: B708-98Specifications: diameter of circular target (25-400) mm (3-28) mm * thicknessSqu... |
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