Sputtering target of zirconium semiconductor vacuum coating
The target material of coating is the sputtering source which forms various functional films on the substrate by magnetron sputtering, multi arc ion plating or other types of coating system under appropriate technological conditions. In short, the target material is the target material bombarded by high-speed charged particles. When used in high-energy laser weapons, different power density, different output waveforms, different wavelengths of laser interact with different target materials, it will produce different damage effects. For example, evaporative magnetron sputtering coating is heating evaporative coating, aluminum film, etc. By replacing different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.), different film systems (such as super hard, wear-resistant, corrosion-resistant alloy films, etc.) can be obtained.
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