Atomic Layer Deposition for R&D
Atomic Layer Deposition for R&D
Material Compatibility:
Oxides: Al₂O₃, SiO₂, TiO₂, ZnO, ZrO₂, HfO₂, Ta₂O₅, MgO, etc.
Nitrides: AlN, TiN, ZrN, HfN, WN
Metals: Ru, Pd, Pt, Ni, Co, W
Sulfides: MoS₂, WS₂, ZnS, TiS₂
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