Photoresist Thinner
Photoresist Thinner
Thinner
Thinner is a chemical commonly used in semiconductor manufacturing to adjust the concentration and viscosity of photoresist to meet process requirements.
Description
is a chemical commonly used in semiconductor manufacturing to adjust the concentration and viscosity of photoresists to meet process requirements. The main components of photoresist diluent include organic solvents and additives. The photoresist is a polymer that is generally insoluble in water, so an organic solvent is needed as a medium to dilute the photoresist. Organic solvents can effectively disperse the photoresist, making it easy to coat on the substrate and easy to remove after exposure.
According to different resin systems and line width requirements, such as G (436nm) line, I (365nm) line, KrF (248nm) line, EUV (13.5nm) line, etc., our company has corresponding formulas, adding solubilizers, antireflective agents, surfactants, and antioxidants developed by our company, which have good performance.
Main uses of diluents in semiconductor manufacturing
1. Photoresist dilution:
In the photolithography process, the viscosity of the photoresist needs to be adjusted according to the specific process requirements. Diluents are used to dilute the photoresist to make it easier to spin-coat on the wafer surface to form a uniform film.
For example, during the coating process, diluents can reduce the viscosity of the photoresist to ensure that it can be evenly distributed during spin coating.
2. Equipment cleaning:
Diluents are used to clean coating equipment, developing equipment, and other process equipment to remove residual photoresist or other chemicals.
For example, after coating, diluents are used to clean the nozzles and pipes of the coating machine to prevent the photoresist from solidifying and clogging the equipment.
3. Chemical concentration adjustment:
In some processes, diluents are used to adjust the concentration of chemicals to meet specific process requirements.
For example, in wet etching or cleaning processes, diluents can be used to adjust the concentration of etching solution or cleaning solution.
4. Stripping:
After the photolithography process is completed, diluents can be used to remove photoresist from the wafer surface.
For example, in some degumming processes, a diluent is mixed with the degumming solution to improve the degumming efficiency.
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